Photosensitive monomer allows polyurethanes to be degraded by light
Polymer designed to have a cleaving point after every second monomer unit
Scientists in Australia and Germany have unveiled a new method for photolysing polyurethanes. Led by Christopher Barner-Kowollik at Queensland University of Technology, the group incorporated photosensitive o-nitrobenzyl moieties into a polyurethane, which enabled the polymer to be broken down upon exposure to UV light. Barner-Kowollik says the approach could aid the development of polyurethane-based degradable packaging and adhesives, and hopes it can be extended to other polymers.